Reactive-ion etching (RIE) is an etching technology used in microfabrication. It uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it. == Equipment == A typical (parallel pl...
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http://en.wikipedia.org/wiki/Reactive-ion_etching
(from the article `integrated circuit`) A layer can be removed, in entirety or in part, either by etching away the material with strong chemicals or by reactive ion etching (RIE). RIE is ...
Found on
http://www.britannica.com/eb/a-z/r/17
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